描述
Ingredients: Water, Butylene Glycol, Glycerin, DPG, PEG-8, Glycosyl Trehalose, Sodium Chondroitin Sulfate, Succinyl Atelocollagen, Serine, Sodium Hyaluronate, Bifida Ferment Lysate, Hydrolyzed Collagen, Soluble Collagen, Soy Milk Ferment Filtrate, EDTA-2Na, Ethanol, Xanthan Gum, Glycereth-26, Methyl Gluceth-10, Disodium Phosphate, Sodium Phosphate, Hydrolyzed Hydrogenated Starch, Ethylparaben, Phenoxyethanol, Methylparaben, Sodium Benzoate
- KOSE Clear Turn EX Ultra Rich Moisturizing Face Mask (40 Sheets)
Usage Instructions:
- Use the mask immediately after taking it out.
- For hygiene reasons, do not reuse a mask.
- After sunburn, use only after redness and heat have subsided.
- Do not use for an extended period or sleep with the mask on.
- Do not flush the sheet, as it does not dissolve in water.
Storage Instructions:
- To prevent quality deterioration from drying, close the zipper tightly after use.
- After opening, store with the zipper facing upward to prevent leakage.
- Use within 100 days after opening.
- Store in a cool, dry place, away from direct sunlight.
- Keep out of reach of infants and children.
- Any unevenness in the essence may occur, but this does not affect the quality.
Ingredients: Water, DPG, Butylene Glycol, Glycerin, Ethanol, Argania Spinosa Kernel Oil, Serine, Tocopherol, Sodium Hyaluronate, Polyquaternium-51, Meadowfoam Seed Oil, Ubiquinone, Soluble Collagen, EDTA-2Na, PEG-20 Hydrogenated Castor Oil, Cetearyl Alcohol, Tetraoleate Sorbeth-30, Polysorbate 80, Mineral Oil, Disodium Phosphate, Sodium Phosphate, Phenoxyethanol, Methylparaben
- KOSE Clear Turn EX Plumping Mask (50 Sheets, Anti-Wrinkle & Moisturizing Face Mask)
Product Introduction: Contains CICA ingredient (Centella Asiatica Extract). Designed to soothe skin irritated by daily external stressors like mask friction and dryness, promoting healthier skin.
Ingredients: Water, Butylene Glycol, DPG, Glycerin, PPG-10 Methyl Glucose Ether, Glycosyl Trehalose, Sage Oil, Centella Asiatica Leaf Extract, Houttuynia Cordata Extract, Sodium Hyaluronate, Lactobacillus/Pear Juice Ferment Filtrate, EDTA-2Na, PEG-8, Acrylates/Alkyl Acrylate (C10-30) Crosspolymer, Isostearoyl PEG-50 Hydrogenated Castor Oil, Xanthan Gum, Diglycerin, Triethylhexanoin, Hydrolyzed Hydrogenated Starch, Sodium Hydroxide, Phenoxyethanol, Methylparaben
- KOSE Clear Turn CICA Moist Mask (40 Sheets, Low Irritation, Large Capacity)
Product Introduction: Contains CICA ingredient (Centella Asiatica Extract). Formulated to soothe skin irritated by daily external stressors like mask friction and dryness, leading to healthier skin.
Ingredients: Water, Butylene Glycol, DPG, Glycerin, PPG-10 Methyl Glucose Ether, Glycosyl Trehalose, Sage Oil, Centella Asiatica Leaf Extract, Houttuynia Cordata Extract, Sodium Hyaluronate, Lactobacillus/Pear Juice Ferment Filtrate, EDTA-2Na, PEG-8, Acrylates/Alkyl Acrylate (C10-30) Crosspolymer, Isostearoyl PEG-50 Hydrogenated Castor Oil, Xanthan Gum, Diglycerin, Triethylhexanoin, Hydrolyzed Hydrogenated Starch, Sodium Hydroxide, Phenoxyethanol, Methylparaben